Spin Coaters
For microscopic or spectroscopic investigations
Our spin coaters help you prepare thin films easily within a few minutes. The spin coaters consist of an exchangeable chuck driven by a high speed motor with electronic speed control and an optional vacuum pump.
Both circular and rectangular substrates can be placed on the chuck where they are held in position by the underpressure below the substrate created either by a small pump (SCV-10, SCE-150 and SCC-200 models) or by the centrifugal force during rotation (SCI series models).
The thickness of the film merely depends on the solid/solvent concentration, rotational speed, and time.
The ergonomic design makes theses spin coaters efficient tools for the preparation of thin films of organic and inorganic substances for microscopic or spectroscopic investigations. They do not require specific skills or experience and are maintenance free. A built-in digital indicator displays exactly the rotation speed for testing under reproducible conditions.
By applying rotational speeds up to 18.000 rpm, thin and ultra thin layers of extraordinary homogeneity can be achieved. All spin coaters are high quality products with 2 years warrantee.
SCC-200
Top-Class Microprocessor-Controlled Spin Coater
- Rotational speed up to 12.000 rpm
- Two rotational speed ramps
- Programmable ramp duration: 3 s .. 600 s
- Two rotational speed target values
- Programmable dwell time: 3 s .. 600 s
- Alphanumeric four-line display (20 characters/line)
- 10 rotational speed sequences storable in non-volatile memory
- Display of remaining processing time
- Total process times: 12 s .. 40 minutes
- Active vacuum suction of the sample
- Film thickness range 10 nm to 10 µm
- Easy-to-use and maintenance free design
- Rotational platforms for substrates up to 90 mm diameter
SCE-150
High End Spin Coaters
- Rotational speed up to 9.000 rpm
- Ramp function for the rotational speed
- Programmable ramp duration: 3 s .. 600 s
- Programmable dwell time: 3 s .. 600 s
- Alphanumeric display (20 characters/line)
- Settings stored in non-volatile memory
- Display of remaining processing time
- Total process times: 6 s .. 20 minutes
- Active vacuum suction of the sample
- Film thickness range 10 nm to 10 µm
- Easy-to-use and maintenance free design
- Rotational platforms for substrates up to 90 mm diameter
SCV-10
Economical Spin Coaters
- Rotational speed up to 6000 rpm
- Active vacuum suction of the sample
- Film thickness range 10 nm to 10 µm
- Easy-to-use and maintenance free design
- Rotational platforms for substrates up to 50 mm diameter
SCI Series
Small-Size Economical Spin Coaters
- Rotational speed up to 18.000 rpm
- Film thickness range 10 nm to 10 µm
- Easy to use and maintenance free design
- Rotational platforms for substrates from 10 to 70 mm diameter
- No vacuum pump required
- Ideally suited for use in glove boxes
Accessory for the SCV-10, SCE-150, and SCC-200 models: Small Vacuum pump MVP
- Underpressure of −33,3 kPa
- Flow of 7 litres/min
- Max. 40 dB(A) noise
- Recommended for the SCV, SCE, and SCC models
Due to a novel design of the rotational platform the substrate is hold tightly on which the sample is to be deposited.
Ordering and Delivery Information
- Delivery of SCI, SCV-10, SCE-150, and SCC-200 models includes the spin coater and a switching power supply module (100 V .. 240 V, 50 Hz.. 60 Hz)
- For the SCI model, the sample substrate size has to match the rotational platform inner diameter. Rotational platforms have to be ordered separately and are available with customized inner diameters from 10 mm .. 70 mm; please specify upon ordering.
- The SCC-200, SCE-150, and SCV-10 models includes one rotational platform of 30 mm diameter. A 90 mm diameter platform is optionally available.
- For the SCC-200, SCE-150, and SCV-10 models, a vacuum pump is required. The MVP pump is recommended.